Precision Thin Film Materials for Optical and Semiconductor Applications

01

Evaporation Materials — Fluorides

Low to medium refractive index materials for AR, UV, IR and Glasses Coating

B = Resistive boat E = Electron beam EB = Electron beam (preferred) B(W/Ta/Mo) = Tungsten, Tantalum or Molybdenum boat
Product Name Formula Spec. M.P. (°C) Evap. Source RI @550 nm Transparency Application
Aluminum Fluoride AlF₃ 1–5 mm 1,040 B 1.36 150–9,000 nm UV Coating
Ytterbium Fluoride YbF₃ 1–5 mm 1,160 E 1.48 220–14,000 nm IR Coating
Magnesium Fluoride MgF₂ 1–2 mm / 1–3 mm 2,239 EB 1.38 130–8,000 nm AR UV Glasses
Calcium Fluoride CaF₂ 1–5 mm 1,360 B(W/Ta/Mo) 1.46 N/A AR Coating
Silicon Dioxide SiO₂ 1–3 mm / Ø2×2 / Ø25×10 mm 1,600 EB 1.46 ± 0.03 200–9,000 nm AR UV Filter Glasses
Silicon-Alumina Granules SiO₂ + Al₂O₃ 1–5 mm 1,500 EB 1.47 300–7,000 nm AR Glasses Coating
Why Fluoride Coatings? Fluoride materials are the first choice for anti-reflection (AR) and UV-transmitting coatings. MgF₂ offers excellent durability across 130–8,000 nm. AlF₃ delivers the lowest RI (1.36), ideal for UV. CaF₂ is widely used for broadband AR on optics.
02

Evaporation Materials — Oxides & Compounds

Medium to high refractive index materials for HR, AR, UV, IR and Multilayer Coating

E = Electron beam  |  EB = Electron beam (preferred)
Product Name Formula Spec. M.P. (°C) Evap. RI @550 nm Transparency Application
Zirconia Alumina ZrO₂ + Al₂O₃ 1–5 mm 1,127 EB 1.70 0.3–7 μm Multilayer
Yttrium Fluoride YF₃ 1–5 mm 1,387 EB 1.59 220–14,000 nm IR Coating
Tungsten Oxide WO₃ 1–2 / 1–3 mm 1,473 EB 2.00–2.28 380–14,000 nm HR Coating
Lanthanum Fluoride LaF₃ 1–5 mm 1,500 B(W/Ta) 1.59 140–14,000 nm UV Coating
Aluminum Oxide Al₂O₃ 1–3 mm 2,054 EB 1.62 200–5,000 nm AR Protective
Magnesium Oxide MgO 1–5 mm 2,800 EB ~7.0 0.2–8 μm AR Coating
Silicon Monoxide SiO 1–10 mm 1,700 EB 1.85 ± 0.03 700–9,000 nm UV Coating
Yttrium Oxide Y₂O₃ 1–5 mm 2,145 E 1.79 250–12,000 nm IR Coating
Titanium Monoxide TiO 1–10 mm 1,750 E 2.18 400–12,000 nm Optical Coating
Titanium Sesquioxide Ti₂O₃ 1–3 mm 2,130 E 2.35 400–12,000 nm Optical Coating
Titanium Pentoxide Ti₃O₅ 1–3 mm 1,800 E 2.32 400–12,000 nm AR HR Glasses
Titanium Dioxide TiO₂ 1–3 mm 1,780 E 2.18 400–12,000 nm Multilayer HR Glasses
Lanthanum Titanate TiO₂ + La₂O₃ 1–3 mm 1,800 E 2.07 360–7,000 nm AR Multilayer
Zirconia Titania ZrO₂ + TiO₂ Ø23×12 mm 2,100 E 2.08 360–7,000 nm AR Multilayer
Zirconia Tantala ZrO₂ + Ta₂O₅ Ø18×8 mm / 1–3 mm 2,100 E 1.98 400–9,000 nm Multilayer
Zinc Sulfide ZnS 1–3 / 3–5 mm 1,850 2.35 400–15,000 nm Filter Cold Light
Tantalum Pentoxide Ta₂O₅ 1–3 mm 1,800 EB 2.15 350–9,000 nm HR IR Filter
Niobium Oxide Nb₂O₅ 1–3 mm 1,460 EB 2.34 350–9,000 nm HR Coating Filter
Hafnium Oxide HfO₂ 1–3 mm 2,811 E 1.99 200–9,000 nm HR AR UV
Cerium Oxide CeO₂ 1–3 mm 1,950 E 1.95–2.05 0.4–12 μm AR Coating
03

Evaporation Materials — Pure Metals

Metal thin film materials for reflective, conductive and protective coatings

Product Name Formula M.P. (°C) Evap. Source Application
Aluminum Al 660 B (Resistive boat) Cold Light Coating HR Coating
Silver Ag 962 EB HR Coating
Gold Au 1,064 B (Resistive boat) HR Coating Conduction Coating
Copper Cu 1,084 EB HR Coating Protected Coating
Rhodium Rh 1,966 EB HR Coating
04

Evaporation Accessories

Crucibles, evaporation boats and filaments for thermal & electron beam deposition

Material Purity Crucible Boat Filament M.P. (°C) Density (g/cc) Colour Notes
Cu (Copper) 99.97% 1,084 8.96 Copper red Easily oxidised
Mo (Molybdenum) 99.95% 2,630 10.22 White grey Stable, brittle
W (Tungsten) 99.95% 3,407 19.35 White grey Stable, brittle
Ta (Tantalum) 99.99% 2,996 16.65 Dark grey Chemically stable
C (Graphite) 99.99% 3,850 1.8 Black Chemically stable
Nb (Niobium) 99.95% 2,468 8.57 Steel grey
Al₂O₃ (Alumina) 99.5% 2,020 3.0–3.6 White Brittle
BN (Boron Nitride) 99.5% 3,000 2.80–3.20 White
SiO₂ (Silica) 99.99% 1,710 2.32 Transparent Brittle

✓ = Available in this form  |  All sizes available on request

05

Sputtering Targets — Alloys & Compound Oxides

For flat panel display, semiconductor and advanced optical coating applications

Flat = Planar sputtering target  |  Rotary = Rotating cylindrical target
Product Name Chemical Formula Purity Form
Silicon-Aluminum Alloy Target Si + Al 99.9% / 99.99% Flat Rotary
Nickel-Chromium Alloy Target Ni + Cr 99.8% / 99.99% Flat
Titanium-Aluminum Alloy Target Ti + Al 99.6% / 99.9% Flat
Aluminum-Scandium Alloy Target Al + Sc 99.99% Flat
Indium-Tin Alloy Target In + Sn 99.99% Flat
High-Purity Aluminum Alloy Target Al alloy 99.99% – 99.9995% Flat
High-Purity Silver Alloy Target Ag alloy 99.99% / 99.995% Flat
High-Purity Gold Alloy Target Au alloy 99.99% / 99.999% Flat
High-Purity Copper Alloy Target Cu alloy 99.99% / 99.999% Flat
High-Purity Molybdenum Alloy Target Mo alloy 99.95% Flat
High-Purity Nickel Alloy Target Ni alloy 99.99% Flat
High-Purity Silicon Alloy Target Si alloy 99.99% Flat Rotary
Silicon Dioxide Target SiO₂ 99.995% Flat
Niobium Oxide Target Nb₂Ox 99.99% Flat Rotary
Titanium Oxide Target TiOx 99.99% Flat Rotary
ITO Target (Display / PV) In₂O₃ + SnO₂ 99.99% Flat Rotary
AZO Target ZnO + Al₂O₃ 99.99% Flat Rotary
IGZO Target In₂O₃ + Ga₂O₃ + ZnO 99.99% Flat Rotary
ITO Target Highlights — Display: G4.5, G5, G5.5, G6, G8.5, G11 generation panel lines. Photovoltaic: mobility 50–60 cm²/V·s, carrier concentration 1–3 × 10²⁰/cm³. Qualified at BOE, CSOT, Innolux & AUO.
06

Sputtering Targets — Pure Metals

High-purity elemental targets for semiconductor, display, optical and electronic applications

Product Name Formula Purity Form
Aluminum Target Al 99.99% – 99.9995% Flat Rotary
Silver Target Ag 99.99% – 99.999% Flat Rotary
Gold Target Au 99.99% / 99.999% Flat
Copper Target Cu 99.97% – 99.999% Flat Rotary
Chromium Target Cr 99.5% / 99.95% Flat Rotary
Graphite Target C 99.99% Flat Rotary
Cobalt Target Co 99.9% Flat
Iron Target Fe 99.99% Flat
Germanium Target Ge 99.999% Flat
Hafnium Target Hf 99.9% Flat
Indium Target In 99.99% Flat Rotary
Magnesium Target Mg 99.99% Flat
Molybdenum Target Mo 99.95% Flat Rotary
Niobium Target Nb 99.95% Flat Rotary
Nickel Target Ni 99.9% / 99.99% Flat
Silicon Target Si 99.99% / 99.999% Flat Rotary
Scandium Target Sc 99.99% Flat
Tin Target Sn 99.99% Flat Rotary
Tantalum Target Ta 99.99% Flat Rotary
Titanium Target Ti 99.6% – 99.995% Flat Rotary
Tungsten Target W 99.95% Flat
Zirconium Target Zr 99.60% Flat Rotary
Semiconductor-Grade Capabilities — High-purity refining & smelting · In-house lab: GDMS, SEM, C/H/O/N/S gas analyser · Precision CNC machining (custom shapes & sizes) · Grain structure control via forging & rolling · Technical application support team.

Need a Custom Specification?

We supply materials to custom sizes, purities and geometries. Contact us for datasheets, samples, or a tailored quotation — typical lead time 2–4 weeks.

Contact Us